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Research Facilities

We are merited by many shared facilities from the Tanaka-Ohya group, Cryogenic Research Center and Nanotechnology Platform of The University of Tokyo

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III - V Group Molecular Beam Epitaxy System (EQ2100)

Base pressure: 1×10^-10Torr

 

Installed sources:

Ga,Al,In(Group III)
Si, Be (Dopants)
Mn, Fe (Transition element, for magnetic material)
As(Group V) EPI Valved cracker cell 500 cc
Sb (group V) MBE Komponenten valved cracker cell 420 cc

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In-situ observation: Reflection High Energy Electron Diffraction (RHEED)

※ Using under collaboration with Tanaka lab

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Dirac-Materials Molecular Beam Epitaxy System (MBE508)

Base pressure: 1×10^-10Torr

 

Installed sources:

Ga,Al,In(Group III)
Sn, Bi, Fe 
As(Group V) EPI Valved cracker cell 500 cc
Sb (group V) K-cell

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In-situ observation: Reflection High Energy Electron Diffraction (RHEED)

※ Using under collaboration with Tanaka lab

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Metal Molecular Beam Epitaxy System (System M)

Base pressure: 1×10^-9Torr

Substrate can be cooled using Liquid Nitrogen

â—† MBE chamber (4 ports): Fe,Al,Sn
â—† E-beam deposition chamber (3 pockets): SiO2, Nb, EuS

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Available for Shadow-mask growth  

Magnetic Circular Dichroism (MCD) System – JASCO J700

Magnetotransport Measurement System (3 systems)

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â—† Photo-detector:GaAs, S1 Photomultiplier (wavelength range 0.2-1.1μm)

◆ Magnetic field range:~1.2T

◆ Temperature range:4.5K ~ RT

◆ Magnetic field range:~1T

◆ Temperature range:3.5K ~ RT

â—† Motor-driven Magnet Rotation System

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Oxford Inst. Superconducting Magnet System

Cryogen-free.

Magnetic field range:0~12T

Temperature range:295 mK ~ RT

Magnetic Properties

Measurement System 3

(common facility of Cryogenic Research Center)

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Magnetic field range:0~7T

Temperature range:1.5 K ~ RT

Electron Spin Resonance

(ESR) System

(common facility of Nanotechnology Platform)

Nano-device Fabrication Lab

(common facility of Dept. of EEIS)

Takeda Super-cleanroom

(common facility of Nanotechnology Platform,

the University of Tokyo)

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